Karl SUSS MJB-3

Listing description

The Karl Suss MJB 3 Mask Aligner is designed for high resolution photolithography in a laboratory, development or pilot production environment. The MJB 3 offers unsurpassed flexibility in the handling of irregular shaped substrates and pieces of differing thickness, as well as standard size wafers up to 3" in diameter.

Microscope:

M400 Normalfield with revolving objective turret and trinocular microscope head

Microscope Objectives:

Leitz NPL 5X, 10X, and 20X objectives

Microscope Oculars:

10X eyepieces

Lamphouse:

350W lamphouse

Lamp:

350W High Pressure Mercury (Hg) lamp is currently installed

Exposure Optics:

UV400

Optical Sensor:

CH1: 365nm, CH2: 405nm

Timer:

Digital

CIC Power Supply:

CIC 1000 constant intensity controller

NOTE:

THIS MJB 3 CAN ALSO BE ORDERED FOR THE FOLLOWING CONFIGURATIONS:
DUV APPLICATIONS (254nm) IR ALIGNMENT.
PLEASE CONTACT US FOR DETAILS AND PRICING

Tooling:

Includes one (1) set of standard mask holder and matching wafer alignment chuck to customer''s desired wafer size

Vib/Iso Table:

Sold separately; subject to availability at time of order

This equipment is located in US