Oxford Plasmalab 100 P

Listing description

OXFORD PLASMALAB 100 PECVD consisting of:

- Model: Plasmalab 100 PECVD
- Process: SiO2 and SiN deposition
- Max Wafer Size Capable: 8/200mm
- Single wafer process up to 8-inch wafer
- Load Locked Chamber
- 600W RF Generator
- Substrate Electrode: 205mm
- Shower Head Gas Inlet Optimised for PECVD
- 400° C Substrate Table
- System Computer
- System Chiller
- Alcatel 2033 Vacuum Pump (Loadlock Pump)
- Alcatel 2033 Vacuum Pump & RSV301B Blower (Chamber Pump)
- Oxford PC2000 Software
- Windows XP Operating Software (OS)
- Operations Manuals for Plasmalab 100 PECVD

- Manufactured in 2008!
- Serial number: 94-814892
- CE Certified

- Gas cabinet setup with 7 gases as follows:
1. CF4/O2

500sccm

MKS 1179
viton seals
2. N2

2SLM

MKS 1179
viton seals
3. N2O

1SLM

MKS 1179
viton seals
4. HE

2SLM

MKS 1179
viton seals
5. SiH4

50sccm

MKS 1479
metal seals
6. PH3/AR

50sccm

MKS 1479
metal seals
7. B2H6/AR

50sccm

MKS
1479 metal seals

This equipment is located in US