TEL TEL Clean Trac

Listing description

TEL Clean Track ACT12 - 200mm 8inch DUV Coater/Developer
•
Manufacturer: Tokyo Electron

•
Model: ACT12 200mm DUV Dual Process Block Track

•
Wafer Size: 200mm

•
Utilized with Nikon S204 Scanner Exposure Tool

General
•
iUSC SECSI, SECSII, HSMS, & GEM Interface Compatibility

•
4 Blocks Interfaced: Cassette72 Process Blocks7Scanner Interface

•
4 Wafer Transfer Robot Arms: Cassette72 Process Blocks7Scanner
Interface

•
Control Module on Cassette End7Station (CES)
Interface Block

•
Single7pincette shared wafer transfer with centering guides
•
Standard wafer arm and interface panel to accommodate
stepper/scanner
•
Interface includes a CPL for insuring consistent wafer temps into the
stepper/scanner
2 COATERS (COT)
•
4 resist nozzles with temperature control
•
16 layer resist and solvent filters
•
RRC Pumps
•
4L or 1L Nowpak capability
•
SS 0.3mm diameter side rinse nozzle with flow meter
•
2 SS 0.3mm diameter back rinse nozzles
4 DEVELOPERS (DEV)
•
2 “H” nozzles with temperature control per cup

16 layer developer filter

•
Bulk7FSI system for developer
2 ADHESION PROCESS STATIONS (ADH)
•
Half sealed chamber with dispersion plate for HMDS

6 Chill Plate Process Stations with temperature control (CPL)

Transfer Chill Plate (TCP)

8 Low Temperature Hot Plate Process Stations with temperature control
(LHP)

4 Chilling Hot Plate Process Stations (CHP)
1 Wafer Edge Exposure Process Station (WEE)
•
DUV illumination monitor on lamp housing
•
Uses a 250W ultra pressure Mercury lamp with 5x4mm illumination
pattern
Subcomponents
•
Fluid Temperature Controller

•
Temperature & Humidity Controller – 2x
•
Chemical Cabinet

•
AC Power Box

This equipment is located in US