UTE 124 Substra SCS e

Listing description

UTE Model SCS e 124 Substrate Cleaning System
Model SCSe Series Systems offer the ideal solution for submicron cleaning of Photomaks, Wafers and Substrates. The SCSe Systems can be configured with a variety of cleaning options ranging from high pressure or Megasonic nozzles, chemical dispenses, or heated DI Water. The Units could also be configured with several different chuck options for single substrate and multiple substrates orientations. Compatible with substrates up to 12” to 20” diameter depending on specific model.

This equipment is located in US