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Ebara UFP-200/300M P240221877
Ebara UFP-200/300M P240221877
Ebara UFP-200/300M P240221877
Ebara UFP-200/300M P240221877

EBARA UFP-200/300M Electro Plate Verified seller

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Manufacturer Ebara
Model UFP-200/300M
Year
Location South Korea KR
Category Semiconductor - Wafer equipment
Product id P240221877
Language
bg Машина за вафли Ebara UFP-200/300M
cs Waferovací stroj Ebara UFP-200/300M
da Wafer maskine Ebara UFP-200/300M
de Ebara UFP-200/300M Waferanlage
el Μηχανή γκοφρέτας Ebara UFP-200/300M
en EBARA UFP-200/300M Electro Plate
es Máquina para wafer Ebara UFP-200/300M
fr Machine pour wafer Ebara UFP-200/300M
hr Stroj za oblatne Ebara UFP-200/300M
hu Ebara UFP-200/300M Ostya gép
it Macchina per wafer Ebara UFP-200/300M
lt Vaflių mašina Ebara UFP-200/300M
nl Ebara UFP-200/300M Wafelmachine
pl Maszyna do produkcji płytek półprzewodnikowych Ebara UFP-200/300M
pt Máquina de wafer Ebara UFP-200/300M
ro Aparat pentru napolitane Ebara UFP-200/300M
ru Ebara UFP-200/300M Пластина
sr Mašina za vafle Ebara UFP-200/300M
sv Ebara UFP-200/300M Wafer maskin
tr Wafer Makinası Ebara UFP-200/300M

Specifications

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Worked hours
Hours under power
State good
At local norms ---------
Status

Description

EBARA UFP 200 / 300M Photoresist Equipment is a state-of-the-art lithography system used to create intricate patterns and features on substrates. This unit is ideal for use in the production of high-tech integrated circuits, semiconductor devices, and other components used in the fabrication of microelectronic circuitry. It features a modular design to accommodate various production requirements. The machine is capable of producing feature sizes as small as 5 microns, using high quality lithographic masks. A high-precision linear encoder is used to ensure consistent alignment and overlay. It also includes an optional multi-layer capability to produce multiple layers of patterns with excellent consistency. The tool uses a specialty high-resolution imaging asset to accurately expose the selected photoresist to UV light. This exposure process produces a precise pattern of exposed and unexposed areas, which will later be transferred to the substrate. UFP 200 / 300M model also includes a drying module with precise temperature control and a spray-coating module for uniform coating. The developed photoresist is then transferred to the substrate through a direct contact process. This transferring process requires accurate registration between the mask and substrate. EBARA UFP 200 / 300M equipment features a precise X-Y stage to ensure precise alignment and overlay between the two. It also features an imaging system, capable of producing high-resolution images of the substrates and mask after contact. In addition, UFP 200 / 300M photoresist unit features a post-exposure etching process and a bake module. The post-exposure etching process is responsible for removing the photoresist that was not exposed to UV light. The bake module enables precise control over the temperature of the substrate and the photoresist, which is essential for proper etching. Finally, EBARA UFP 200 / 300M machine includes a cleaning process for removing any remaining photoresist from the substrate. This ensures accuracy and repeatability of the pattern transfer process and reduces potential for contamination. With its advanced features, UFP 200 / 300M Photoresist Tool is the ideal solution for a variety of microelectronics fabrication requirements.

Please note that this description may have been translated automatically. Contact us for further information. The information of this classified ad are only indicative. We recommend to check the details with the seller before a purchase


Client type Reseller
Active since 2021
Offers online 11
Last activity Oct. 14, 2024

Description

EBARA UFP 200 / 300M Photoresist Equipment is a state-of-the-art lithography system used to create intricate patterns and features on substrates. This unit is ideal for use in the production of high-tech integrated circuits, semiconductor devices, and other components used in the fabrication of microelectronic circuitry. It features a modular design to accommodate various production requirements. The machine is capable of producing feature sizes as small as 5 microns, using high quality lithographic masks. A high-precision linear encoder is used to ensure consistent alignment and overlay. It also includes an optional multi-layer capability to produce multiple layers of patterns with excellent consistency. The tool uses a specialty high-resolution imaging asset to accurately expose the selected photoresist to UV light. This exposure process produces a precise pattern of exposed and unexposed areas, which will later be transferred to the substrate. UFP 200 / 300M model also includes a drying module with precise temperature control and a spray-coating module for uniform coating. The developed photoresist is then transferred to the substrate through a direct contact process. This transferring process requires accurate registration between the mask and substrate. EBARA UFP 200 / 300M equipment features a precise X-Y stage to ensure precise alignment and overlay between the two. It also features an imaging system, capable of producing high-resolution images of the substrates and mask after contact. In addition, UFP 200 / 300M photoresist unit features a post-exposure etching process and a bake module. The post-exposure etching process is responsible for removing the photoresist that was not exposed to UV light. The bake module enables precise control over the temperature of the substrate and the photoresist, which is essential for proper etching. Finally, EBARA UFP 200 / 300M machine includes a cleaning process for removing any remaining photoresist from the substrate. This ensures accuracy and repeatability of the pattern transfer process and reduces potential for contamination. With its advanced features, UFP 200 / 300M Photoresist Tool is the ideal solution for a variety of microelectronics fabrication requirements.

Please note that this description may have been translated automatically. Contact us for further information. The information of this classified ad are only indicative. We recommend to check the details with the seller before a purchase

Specifications

-------------------
Worked hours
Hours under power
State good
At local norms ---------
Status

About this seller

Client type Reseller
Active since 2021
Offers online 11
Last activity Oct. 14, 2024

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EBARA UFP-200/300M Electro Plate