Specifications

Wafer size 20.32 cm
-------------------
Worked hours
Hours under power
State good
At local norms yes
Status

Description

Gasonics/IPC 9104 Ash/Etch system
12"(dia) x 20"(D) quartz barrel
soft pumping and purge valving
low particulate design
2ea mass flow gas inputs with VCR fittings
all SS plumbing,
multi channel/single board computer controlled, with floppy storage
temperature monitor

ENI OEM 12B 1250W RF Generator

Wafer Size: 4", 6", 8" capability

Capacity: 50 8" wafers, 50-75 6" wafers, 100 4" wafers.Â

Chamber: Quartz, compatible with fluorinated chemistry. 12" diameter x 20" deep. External RF electrodes.

RF Generator: 1250 watt 13.56 MHz air cooled with automatic impedance matching network. Water cooled optional.

Process Pressure: Approx. 120 - 2000 mtorr.

Stainless Steel Plumbing.

Temperature Monitor: Quartz-coated thermocouple located in the process chamber.

Display: Color 12.1" touch screen for control and monitoring of process parameters, automatic recipes, or manual plasma treatments.

Four user specified gases, with 500 sccm Stainless Steel MFCs come standard with an optional 3rd and/or 4th gas channel available.

Power Requirements: 208 - 240 volts, 3 phase, 50/60 Hz 5 wire "wye".

A NEMA-12 wall mounting enclosure with locking handle contains the AC power control for the asher, power supply, and pump, allows for a single source drop for the complete system.

CE Certified.

Please note that this description may have been translated automatically. Contact us for further information. The information of this classified ad are only indicative. We recommend to check the details with the seller before a purchase


Client type Reseller
Active since 2019
Offers online 73
Last activity Nov. 21, 2024

Description

Gasonics/IPC 9104 Ash/Etch system
12"(dia) x 20"(D) quartz barrel
soft pumping and purge valving
low particulate design
2ea mass flow gas inputs with VCR fittings
all SS plumbing,
multi channel/single board computer controlled, with floppy storage
temperature monitor

ENI OEM 12B 1250W RF Generator

Wafer Size: 4", 6", 8" capability

Capacity: 50 8" wafers, 50-75 6" wafers, 100 4" wafers.Â

Chamber: Quartz, compatible with fluorinated chemistry. 12" diameter x 20" deep. External RF electrodes.

RF Generator: 1250 watt 13.56 MHz air cooled with automatic impedance matching network. Water cooled optional.

Process Pressure: Approx. 120 - 2000 mtorr.

Stainless Steel Plumbing.

Temperature Monitor: Quartz-coated thermocouple located in the process chamber.

Display: Color 12.1" touch screen for control and monitoring of process parameters, automatic recipes, or manual plasma treatments.

Four user specified gases, with 500 sccm Stainless Steel MFCs come standard with an optional 3rd and/or 4th gas channel available.

Power Requirements: 208 - 240 volts, 3 phase, 50/60 Hz 5 wire "wye".

A NEMA-12 wall mounting enclosure with locking handle contains the AC power control for the asher, power supply, and pump, allows for a single source drop for the complete system.

CE Certified.

Please note that this description may have been translated automatically. Contact us for further information. The information of this classified ad are only indicative. We recommend to check the details with the seller before a purchase


Specifications

Wafer size 20.32 cm
-------------------
Worked hours
Hours under power
State good
At local norms yes
Status

About this seller

Client type Reseller
Active since 2019
Offers online 73
Last activity Nov. 21, 2024

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