Categories
Start selling

Account

Log In
Create an account

Account

Log In
Create an account
PVD Products, USA NANO PLD 1000 P241126370
PVD Products, USA NANO PLD 1000 P241126370
PVD Products, USA NANO PLD 1000 P241126370
PVD Products, USA NANO PLD 1000 P241126370

Laser Ablation Thin Film Deposition System Verified seller

Price on request

Make an offer
Manufacturer PVD Products, USA
Model NANO PLD 1000
Year 2014
Location Romania RO
Category Semiconductor miscellaneous
Product id P241126370
Language
bg Полупроводникова машина PVD Products, USA NANO PLD 1000
cs Polovodičový stroj PVD Products, USA NANO PLD 1000
da PVD Products, USA NANO PLD 1000 Halvleder maskine
de PVD Products, USA NANO PLD 1000 Sondere Halbleiter Maschine
el Μηχανή ημιαγωγών PVD Products, USA NANO PLD 1000
en Laser Ablation Thin Film Deposition System
es Máquina semiconductor PVD Products, USA NANO PLD 1000
fr Equipement de semi-conducteur PVD Products, USA NANO PLD 1000
hr Poluvodički stroj PVD Products, USA NANO PLD 1000
hu PVD Products, USA NANO PLD 1000 Félvezető gép
it Macchina di semiconduttori PVD Products, USA NANO PLD 1000
lt Puslaidininkinė mašina PVD Products, USA NANO PLD 1000
nl PVD Products, USA NANO PLD 1000 Halfgeleidermachine
pl Maszyna do półprzewodników PVD Products, USA NANO PLD 1000
pt Máquina semicondutora PVD Products, USA NANO PLD 1000
ro Mașină cu semiconductor PVD Products, USA NANO PLD 1000
ru PVD Products, USA NANO PLD 1000 Оборудование для полупроводников
sr Poluprovodnička mašina PVD Products, USA NANO PLD 1000
sv PVD Products, USA NANO PLD 1000 Halvledarmaskin
tr Yarı İletken Makinası PVD Products, USA NANO PLD 1000

Specifications

-------------------
Worked hours
Hours under power
State excellent
At local norms ---------
Status in production

Description

A complex integrated system involving both laser ablation and magnetron spraying is the Nano PLD-1000 system, a fully integrated, pulse-modulated laser deposition instrument capable of depositing multilayer films on substrates up to 2 inches in diameter. The system uses three energy sources: the PhysikCOMPex PRO 110 Coherent Lambda laser, the magnetron scattering source and the Veeco 3 cm ion source.
The Nano-PLD1000 system configuration includes:
• PhysikCOMPex PRO 110 Lambda Coherent Laser. In combination with the Nano PLD system, the PhysikCOMPex PRO Lambda excimer laser is used. The laser is in Ceramic Tube technology and works with repetition speeds of up to 100Hz. The maximum power used is 20 MWatts/pulse (248-nm, KrF).
• PVD Products Titan magnetron spreader source with target diameter of 5 cm. It can operate in both direct current and radio frequency currents.
• Operates in RF (300 W) or DC pulse (400 W) system
• Operates between 0.5 mTorr to 1 Torr
• Max power DC 600 Watt
• Max power RF 400 Watt
• Cathod voltage 200 - 1000 Volt
• Veeco 3cm ion source that includes focus grids and a neutralizer for hot filament. The beam energy is from 50 to 1200 eV at a maximum current of 100mA.
• Vacuum Chamber - The system includes multiple additional flanges for options or other accessories, such as sample change sluice, atomic absorption or emission spectroscopy, ion cannon, or sputtering coverage source. The camera also includes target and substrate viewing ports.
• Vacuum assembly, vacuum probes and gas distributor. The system contains a valve assembly, a Pfeiffer water-cooled vacuum probe, a turbo-molecular pump with a capacity of 250 l/s and 60,000 RPM, which works in tandem with a preliminary rotary vacuum pump. For vacuum measurement, the InstruTech Super-Bee Convectron Gauge probe (from atmospheric pressure to 10-3 torr) and the Hornet Bayard Alpert ion probe (up to 10-9 torr) are used. For the process gas, an MKS programmable digital flow meter (50 sccm) calibrated for oxygen is used, with manual shut-off valve.
• Fixed position optical path. It operates at a wavelength of 248 nm (KrF). The optical assembly includes sets of 2-inch diameter HR mirrors mounted in mobile mounts that provide highly accurate positioning of the laser beam on the target surface. The angle of incidence for the laser beam on the target is 60° from the normal on the target. This angle of incidence reduces the amount of deposition material that reaches the laser window during operation, unlike systems with an angle of incidence of 45°.
Programmable 3-position target manipulator. In the deposition chamber there is a manipulator for three targets, each with a diameter of 3”(optional 6 x 2", with a maximum thickness of 6mm). The two-axis ferrofluidic rotary flange allows both the computerized selection and model of the target used for ablation (for efficiency) and a continuous rotation of the target with up to 50 RPM.
• Oxygen-resistant substrate heater. Integrated into the upper part of the chamber is the substrate heater, which can provide a temperature of up to 6000°C. The heater has a water-cooled coating to minimize heating of the walls of the room. Target-substrate distance is set to 75mm.
• The Nano PLD IW Intelligent Window system provides the laser beam with a clean optical path for a longer period of time compared to conventional systems. The unit contains an internal large-diameter quartz glass disc mounted on a manually rotating interface for monitoring. The window also includes a beam splitter, mounted on a linear actuator.
• Hatch for changing the sample. This option allows a small loading lock to be integrated into the system. The substrate holder is mounted on a Z-axis bracket, motorized with the 2" stroke. The lock has a quick access door for sample transfer along with a magnetically coupled linear actuator for inserting the holder into the main chamber. The lock contains a preliminary vacuum valve and a turbo-molecular pump with a capacity of 70l/sec and 90,000 RPM. The preliminary vacuum pump of the main chamber is used in combination with the turbo pump of the lock and is connected by corresponding valves. Vacuum measurement is done using an ion probe and a Convectron. By using the lock, the base pressure in the main chamber is guaranteed to be less than 5 x 10-8 Torr.
• Optical pyrometer, with spectral response from 0.78 to 1.06μm, connected by optical fiber, mounted on a flange. The assembly includes an adjustable fiber optic interface, mounted on a substrate viewing point, located 75mm from the substrate surface. The measuring range of the pyrometer is from 500 to 2000°C.
• Additional mass flow meters w/manual valve
• Closed circuit water cooler
• Air compressor
• Rotary substrate assembly with up to 40 RPM ensures computer controlled precise rotation of the substrate, improving the uniformity of the deposited film.

Please note that this description may have been translated automatically. Contact us for further information. The information of this classified ad are only indicative. We recommend to check the details with the seller before a purchase


pvd-products-usa-nano-pld-1000-p241126370_3.pdf Download
Client type User – small or medium company
Active since 2024
Offers online 2
Last activity Dec. 30, 2024

Description

A complex integrated system involving both laser ablation and magnetron spraying is the Nano PLD-1000 system, a fully integrated, pulse-modulated laser deposition instrument capable of depositing multilayer films on substrates up to 2 inches in diameter. The system uses three energy sources: the PhysikCOMPex PRO 110 Coherent Lambda laser, the magnetron scattering source and the Veeco 3 cm ion source.
The Nano-PLD1000 system configuration includes:
• PhysikCOMPex PRO 110 Lambda Coherent Laser. In combination with the Nano PLD system, the PhysikCOMPex PRO Lambda excimer laser is used. The laser is in Ceramic Tube technology and works with repetition speeds of up to 100Hz. The maximum power used is 20 MWatts/pulse (248-nm, KrF).
• PVD Products Titan magnetron spreader source with target diameter of 5 cm. It can operate in both direct current and radio frequency currents.
• Operates in RF (300 W) or DC pulse (400 W) system
• Operates between 0.5 mTorr to 1 Torr
• Max power DC 600 Watt
• Max power RF 400 Watt
• Cathod voltage 200 - 1000 Volt
• Veeco 3cm ion source that includes focus grids and a neutralizer for hot filament. The beam energy is from 50 to 1200 eV at a maximum current of 100mA.
• Vacuum Chamber - The system includes multiple additional flanges for options or other accessories, such as sample change sluice, atomic absorption or emission spectroscopy, ion cannon, or sputtering coverage source. The camera also includes target and substrate viewing ports.
• Vacuum assembly, vacuum probes and gas distributor. The system contains a valve assembly, a Pfeiffer water-cooled vacuum probe, a turbo-molecular pump with a capacity of 250 l/s and 60,000 RPM, which works in tandem with a preliminary rotary vacuum pump. For vacuum measurement, the InstruTech Super-Bee Convectron Gauge probe (from atmospheric pressure to 10-3 torr) and the Hornet Bayard Alpert ion probe (up to 10-9 torr) are used. For the process gas, an MKS programmable digital flow meter (50 sccm) calibrated for oxygen is used, with manual shut-off valve.
• Fixed position optical path. It operates at a wavelength of 248 nm (KrF). The optical assembly includes sets of 2-inch diameter HR mirrors mounted in mobile mounts that provide highly accurate positioning of the laser beam on the target surface. The angle of incidence for the laser beam on the target is 60° from the normal on the target. This angle of incidence reduces the amount of deposition material that reaches the laser window during operation, unlike systems with an angle of incidence of 45°.
Programmable 3-position target manipulator. In the deposition chamber there is a manipulator for three targets, each with a diameter of 3”(optional 6 x 2", with a maximum thickness of 6mm). The two-axis ferrofluidic rotary flange allows both the computerized selection and model of the target used for ablation (for efficiency) and a continuous rotation of the target with up to 50 RPM.
• Oxygen-resistant substrate heater. Integrated into the upper part of the chamber is the substrate heater, which can provide a temperature of up to 6000°C. The heater has a water-cooled coating to minimize heating of the walls of the room. Target-substrate distance is set to 75mm.
• The Nano PLD IW Intelligent Window system provides the laser beam with a clean optical path for a longer period of time compared to conventional systems. The unit contains an internal large-diameter quartz glass disc mounted on a manually rotating interface for monitoring. The window also includes a beam splitter, mounted on a linear actuator.
• Hatch for changing the sample. This option allows a small loading lock to be integrated into the system. The substrate holder is mounted on a Z-axis bracket, motorized with the 2" stroke. The lock has a quick access door for sample transfer along with a magnetically coupled linear actuator for inserting the holder into the main chamber. The lock contains a preliminary vacuum valve and a turbo-molecular pump with a capacity of 70l/sec and 90,000 RPM. The preliminary vacuum pump of the main chamber is used in combination with the turbo pump of the lock and is connected by corresponding valves. Vacuum measurement is done using an ion probe and a Convectron. By using the lock, the base pressure in the main chamber is guaranteed to be less than 5 x 10-8 Torr.
• Optical pyrometer, with spectral response from 0.78 to 1.06μm, connected by optical fiber, mounted on a flange. The assembly includes an adjustable fiber optic interface, mounted on a substrate viewing point, located 75mm from the substrate surface. The measuring range of the pyrometer is from 500 to 2000°C.
• Additional mass flow meters w/manual valve
• Closed circuit water cooler
• Air compressor
• Rotary substrate assembly with up to 40 RPM ensures computer controlled precise rotation of the substrate, improving the uniformity of the deposited film.

Please note that this description may have been translated automatically. Contact us for further information. The information of this classified ad are only indicative. We recommend to check the details with the seller before a purchase

Specifications

-------------------
Worked hours
Hours under power
State excellent
At local norms ---------
Status in production

About this seller

Client type User – small or medium company
Active since 2024
Offers online 2
Last activity Dec. 30, 2024

Here is a selection of similar machines

See all alternatives

Loading similar machines...

Categories

Menu Categories search

Menu

Start selling

Laser Ablation Thin Film Deposition System